Open AccessSputtering process of Aluminum in Ar/He mixtures
Author(s) -
Soad Ibrahim,
Amaël Caillard,
Pascal Brault,
Thomas Lecas,
Anne-Lise Thomann
Publication year - 2021
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - sputtering , process (computing) , aluminium , materials science , computer science , metallurgy , nanotechnology , thin film , operating system