Open AccessSputtering process of Aluminum in Ar/He mixtures
Author(s) -
S. Ibrahim,
Amaël Caillard,
Pascal Brault,
Thomas Lecas,
AnneLise Thomann
Publication year - 2021
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - sputtering , process (computing) , aluminium , materials science , computer science , metallurgy , nanotechnology , thin film , operating system
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