z-logo
open-access-imgOpen Access
Low Frequency Noise Spectroscopy in Advanced nFinFETS
Author(s) -
Rachida Talmat,
H. Achour,
B. Cretu,
Jean-Marc Routoure,
A. Benfdila,
R. Carin,
N. Collaert,
A. Mercha,
E. Simoen,
Cor Claeys
Publication year - 2011
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - materials science , infrasound , noise (video) , optoelectronics , silicon , transistor , dielectric , gate dielectric , fin , mosfet , spectroscopy , metal gate , electrical engineering , gate oxide , physics , acoustics , computer science , engineering , composite material , voltage , artificial intelligence , quantum mechanics , image (mathematics)

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom