Open AccessImpact of ammonia pretreatment of the silicon surface prior to the deposition of silicon nitride layer by pecvd
Author(s) -
Erwann Fourmond,
Julien Dupuis,
F. Marcq,
C. Dubois,
M. Lemiti
Publication year - 2008
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - passivation , plasma enhanced chemical vapor deposition , materials science , silicon nitride , silicon , layer (electronics) , chemical vapor deposition , locos , nitride , nitriding , carrier lifetime , silicon oxide , chemical engineering , optoelectronics , nanotechnology , engineering