Open AccessA Study on Pressure Distribution for Uniform Polishing of Sapphire Substrate
Author(s) -
Chul jin Park,
Haedo Jeong,
Sangjik Lee,
Doyeon Kim,
Hyoungjae Kim
Publication year - 2016
Publication title -
journal of the korean society of tribologists and lubrication engineers
Language(s) - English
Resource type - Journals
eISSN - 2287-4666
pISSN - 1229-4845
DOI - 10.9725/kstle.2016.32.2.61
Subject(s) - polishing , materials science , wafer , head (geology) , chemical mechanical planarization , abrasive , enhanced data rates for gsm evolution , finite element method , sapphire , substrate (aquarium) , composite material , structural engineering , mechanical engineering , optics , engineering , optoelectronics , physics , telecommunications , laser , oceanography , geomorphology , geology
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