Open AccessEffect of Current Density on Material Removal in Cu ECMP
Author(s) -
Eunjeong Park,
Hyunseop Lee,
Hyoung-Sun Jeong,
Haedo Jeong
Publication year - 2015
Publication title -
yunhwal haghoeji/han-guk yunhwal hakoeji
Language(s) - English
Resource type - Journals
eISSN - 2287-4666
pISSN - 1229-4845
DOI - 10.9725/kstle.2015.31.3.79
Subject(s) - polishing , materials science , electrode , surface roughness , anode , current density , potentiostat , electrochemistry , dissolution , metallurgy , composite material , chemical engineering , chemistry , physics , quantum mechanics , engineering