Open AccessContinuous Process for the Etching, Rinsing and Drying of MEMS Using Supercritical Carbon Dioxide
Author(s) -
Seon Ki Min,
Gap Su Han,
Seong-Sik You
Publication year - 2015
Publication title -
korean chemical engineering research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.168
H-Index - 9
eISSN - 2233-9558
pISSN - 0304-128X
DOI - 10.9713/kcer.2015.53.5.557
Subject(s) - stiction , microelectromechanical systems , wafer , etching (microfabrication) , supercritical carbon dioxide , materials science , supercritical fluid , dry etching , carbon dioxide , solvent , vaporization , chemical engineering , analytical chemistry (journal) , composite material , nanotechnology , chemistry , chromatography , organic chemistry , layer (electronics) , engineering
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