Open Access3D Process Simulation forAdvanced Immersion Lithography
Author(s) -
Shijie Wang,
Ying Lin,
Keng Heng Lai,
Serene Tan,
Qun Ying Lin
Publication year - 2018
Publication title -
international journal of modeling and optimization
Language(s) - Uncategorized
Resource type - Journals
ISSN - 2010-3697
DOI - 10.7763/ijmo.2018.v8.648
Subject(s) - immersion (mathematics) , immersion lithography , lithography , process (computing) , computer science , materials science , nanotechnology , optoelectronics , resist , programming language , mathematics , geometry , layer (electronics)
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