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Structure of a Plasma Ion Source for a Cross-Section SEM Sample
Author(s) -
Jonghan Won,
Dong-Young Jang,
Man-Jin Park
Publication year - 2015
Publication title -
journal of the korean society of manufacturing technology engineers
Language(s) - English
Resource type - Journals
eISSN - 2508-5107
pISSN - 2508-5093
DOI - 10.7735/ksmte.2015.24.4.400
Subject(s) - ion source , wafer , materials science , scanning electron microscope , anode , analytical chemistry (journal) , ion gun , vacuum chamber , argon , sputtering , cathode , ion , ion beam deposition , plasma , silicon , ion beam , chemistry , optoelectronics , electrode , composite material , nanotechnology , thin film , physics , organic chemistry , chromatography , quantum mechanics

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