Open AccessProximity gettering of silicon wafers using CH3O multielement molecular ion implantation technique
Author(s) -
Ryo Hirose,
Takeshi Kadono,
Ryosuke Okuyama,
Satoshi Shigematsu,
Ayumi OnakaMasada,
Hiroyuki Okuda,
Yoshio Koga,
Kazunari Kurita
Publication year - 2018
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjap.57.096503
Subject(s) - ion implantation , wafer , silicon , getter , materials science , ion , epitaxy , analytical chemistry (journal) , stacking , optoelectronics , chemistry , nanotechnology , organic chemistry , chromatography , layer (electronics)