Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom? | Zendy

Kenji Ishikawa | Zendy; Kazuhiro Karahashi | Zendy; Tatsuo Ishijima | Zendy; SungIl Cho | Zendy; Simon D. Elliott | Zendy; Dennis M. Hausmann | Zendy; D. Mocuta | Zendy; Aaron G. Wilson | Zendy; Keizo Kinoshita | Zendy

Open Access

Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?

Author(s) -

Kenji Ishikawa,

Kazuhiro Karahashi,

Tatsuo Ishijima,

SungIl Cho,

Simon D. Elliott,

Dennis M. Hausmann,

D. Mocuta,

Aaron G. Wilson,

Keizo Kinoshita

Publication year - 2018

Publication title -

japanese journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.487

H-Index - 129

eISSN - 1347-4065

pISSN - 0021-4922

DOI - 10.7567/jjap.57.06ja01

Subject(s) - fabrication , nanotechnology , nanoscopic scale , design for manufacturability , aspect ratio (aeronautics) , critical dimension , scale (ratio) , materials science , lithography , etching (microfabrication) , semiconductor device fabrication , computer science , engineering physics , engineering , mechanical engineering , optoelectronics , physics , wafer , alternative medicine , quantum mechanics , layer (electronics) , medicine , optics , pathology

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