Open AccessSimultaneous fabrication of a microcavity absorber–emitter on a Ni–W alloy film
Author(s) -
Nashun,
Masahiro Kagimoto,
Kentaro Iwami,
Norihiro Umeda
Publication year - 2017
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjap.56.100310
Subject(s) - thermophotovoltaic , materials science , common emitter , fabrication , optoelectronics , emissivity , reactive ion etching , etching (microfabrication) , lithography , deep reactive ion etching , optics , nanotechnology , medicine , alternative medicine , physics , pathology , layer (electronics)
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