Open AccessSingle crystalline epitaxial platinum film on Al2O3(0001) prepared by oxygen-doped sputtering deposition
Author(s) -
Hiroyuki Tanaka,
Masateru Taniguchi
Publication year - 2017
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjap.56.058001
Subject(s) - sputtering , crystallinity , crystallite , platinum , materials science , epitaxy , substrate (aquarium) , doping , analytical chemistry (journal) , sputter deposition , thin film , oxygen , deposition (geology) , nanotechnology , chemistry , layer (electronics) , optoelectronics , metallurgy , composite material , catalysis , paleontology , biochemistry , oceanography , organic chemistry , chromatography , sediment , geology , biology