Open AccessIn situ annealing and high-rate silicon epitaxy on porous silicon by mesoplasma process
Author(s) -
Sheng Zhang,
Ziyu Lu,
Jiang Sheng,
Pingqi Gao,
Xi Yang,
Sudong Wu,
Jichun Ye,
Makoto Kambara
Publication year - 2016
Publication title -
applied physics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.911
H-Index - 94
eISSN - 1882-0786
pISSN - 1882-0778
DOI - 10.7567/apex.9.055506
Subject(s) - annealing (glass) , materials science , wafer , epitaxy , porosity , silicon , sintering , porous silicon , rough surface , in situ , optoelectronics , chemical engineering , composite material , layer (electronics) , chemistry , organic chemistry , engineering
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