Open AccessTop-down fabrication of GaN nano-laser arrays by displacement Talbot lithography and selective area sublimation
Author(s) -
B. Damilano,
PierreMarie Coulon,
S. Vézian,
Virginie Brändli,
J.-Y. Duboz,
J. Massies,
Philip A. Shields
Publication year - 2019
Publication title -
applied physics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.911
H-Index - 94
eISSN - 1882-0786
pISSN - 1882-0778
DOI - 10.7567/1882-0786/ab0d32
Subject(s) - materials science , optoelectronics , sublimation (psychology) , lasing threshold , lithography , fabrication , nanowire , photoluminescence , electron beam lithography , laser , epitaxy , nanoimprint lithography , optics , layer (electronics) , nanotechnology , resist , physics , wavelength , psychology , medicine , alternative medicine , pathology , psychotherapist
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