Open AccessOptimization of bending durability of Ti-ZnO thin films on flexible glass substrates with highly enhanced optoelectronic characteristics by atomic layer deposition
Author(s) -
WooJae Lee,
Susanta Bera,
Pung Keun Song,
Jung Woo Lee,
Wei Dai,
Hyeon Chang Kim,
Chang-Su Kim,
SeHun Kwon
Publication year - 2019
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/1347-4065/ab1cf4
Subject(s) - materials science , thin film , atomic layer deposition , layer (electronics) , nanocomposite , composite material , figure of merit , bending , microstructure , optoelectronics , deposition (geology) , nanotechnology , paleontology , sediment , biology
Highly conducting, optically transparent and highly bending-durable Ti-doped ZnO thin film (Ti-ZnO) on flexible Willow Glass TM via atomic layer deposition is reported. The influence of the deposited film’s thickness (from 10 to 50 nm) on its microstructures, mechanical flexibility, and electrical and optical properties was investigated systematically. The results showed that the Ti-ZnO films were converted from non-crystalline structures to nanocomposite structures with increasing film thickness. The film having 40 nm thickness with enhanced optical and electrical properties showed the best figure of merit among all the films. The changes in fracture and resistivity of the films, depending on the bending cycles, showed that the films with thicknesses of 30 and 40 nm exhibited superior flexible stability. Thus, 40 nm Ti-ZnO thin film on flexible Willow Glass TM would be the best sample for efficient optical, electrical and bending properties for flexible device applications.