Open AccessChemical functionalization of silicene
Author(s) -
Simon X. Yang,
Peng Cheng,
Lan Chen,
Kehui Wu
Publication year - 2017
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.66.216805
Subject(s) - silicene , materials science , band gap , surface modification , nanotechnology , dirac (video compression format) , graphene , optoelectronics , physics , chemistry , quantum mechanics , neutrino
Silicene exhibits extraordinary physical properties especially Dirac fermion characteristics. However, the zero-gap band structure of silicene hinders its applications in nanoelectronic and optoelectronic devices. It is thus desirable to open a finite band gap in silicene. Chemical functionalization is a commonly used method to tailor the structures and electronic properties of two-dimensional materials. In this paper we review the recent 3-year progress of silicene, including its hydrogenation, oxidization, halogenation, and other methods to modify silicene.