Open AccessExperimental study on laser produced tin droplet plasma extreme ultraviolet light source
Author(s) -
Hong Cai,
Hui Liang,
Ziqi Chen,
Luning Liu,
Tao Wu,
Zuo Du-Luo,
Peixiang Lu,
Xinbing Wang
Publication year - 2015
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.64.075202
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , laser , materials science , plasma , optics , tin , optoelectronics , radiation , lithography , wavelength , physics , quantum mechanics , metallurgy
Extreme ultraviolet lithography (EUVL), which uses the extreme ultraviolet radiation at a wavelength of 13.5 nm, is the leading candidate of next generation lithography addressing not only the 10 nm half-pitch nodes, but several nodes beyond that. Among all the methods for getting EUV radiation, laser-produced plasma (LPP) light source is the most promising EUV light source because of its high conversion efficiency (CE), large collect angle and low debris output. In this paper, pulsed TEA-CO2 laser and Nd:YAG laser are used to irradiate tin droplets to obtain plasma EUV emission, and the properties of EUV radiation from the plasma are studied. Results show that the EUV emission spectra induced by Nd:YAG laser have an obvious blueshift as compared with those by CO2 laser. In addition, the LPP sources are point light sources, so that the angular distribution of EUV emission from LPP can be described by Lambertian distribution.