Open AccessCellular method combined with Monte Carlo method to simulate the thin film growth processes
Author(s) -
Ruan Cong,
Xiaomin Sun,
Yong Song
Publication year - 2015
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.64.038201
Subject(s) - monte carlo method , computer science , computation , kinetic monte carlo , scale (ratio) , thin film , process (computing) , statistical physics , materials science , algorithm , nanotechnology , physics , mathematics , statistics , quantum mechanics , operating system
Study on simulation method for the thin film growth processes on atomic scale is currently a hot research field. The simulation method mainly aiming at nanometer scale model demands huge computational cost and memory cost. In order to solve the problem, a cellular method combined with Monte Carlo method is presented in this article to simulate the growth processes of thin film on micron scale. Based on cellular method for model representation and evolutionary computation, we greatly reduce the memory requirements and improve the efficiency of computation, and the Monte Carlo method is used to determine the particle migration. Moreover, specific research on the growth process of silicon nitride thin film is implemented, and the simulation results are compared with the experimental data and the molecular dynamics simulation results of the surface morphology and composition, so as to verify the effectiveness of this method.