Open AccessThickness dependence of critical current density in MgB2 films fabricated by hybrid physical-chemical vapor deposition
Author(s) -
陈艺灵,
张辰,
何法,
王达,
王越,
冯庆荣
Publication year - 2013
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.62.197401
Subject(s) - materials science , chemical vapor deposition , superconductivity , critical current , deposition (geology) , thin film , range (aeronautics) , hybrid physical chemical vapor deposition , carbon film , optoelectronics , nanotechnology , combustion chemical vapor deposition , condensed matter physics , composite material , physics , paleontology , sediment , biology
MgB2 superconducting films with a thickness of 10 nm to 8 μ have been prepared on SiC substrates by hybrid physical-chemical vapor deposition (HPCVD). The study on Tc and Jc shows that as the film grows thicker, Tc increases and then keeps stable, which Jc increases at first, and then drops dramatically. We get the maximum Tc at 41.4 K and Jc at 2.3× 108 A·cm-2. This also shows that we can use the method of HPCVD to prepare high-quality of clean MgB2 film. And its thickness can be from 10nm ultrathin films and 100 nm thin films up to 8 μm thick film. It is the first time so far as we know that Tc and Jc are studied in this range of thickness. This will lead to a complete and systematical understanding of the superconducting MgB2 films. And it is also important and practical to choose the thickness when preparing MgB2 films.