Open AccessAnalysis of gas isolation by prominent O-ring on the mold in compressional gas cushion press nanoimprint lithography
Author(s) -
Li Tianhao,
Guoxin Zheng,
Chaoran Liu,
Weiwei Xia,
Dongxue Li,
Zhiyong Duan
Publication year - 2013
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.62.068103
Subject(s) - nanoimprint lithography , materials science , mold , capillary action , resist , lithography , substrate (aquarium) , composite material , photolithography , surface tension , bubble , optoelectronics , nanotechnology , cushion , soft lithography , layer (electronics) , fabrication , mechanical engineering , mechanics , medicine , alternative medicine , pathology , engineering , oceanography , physics , quantum mechanics , geology
Nanoimprint lithography has the advantages of low-cost, high-throughput, ultrahigh resolution, which could make it one of the next generation lithography technologies. However, the bubble-defect is always a problem which may damage the duplicate patterns, so it is an urgent issue to propose effective solutions. A novel methods, which is suitable for compressional gas cushion press nanoimprint lithography in gas atmosphere and could prevent gas from entering the gap between mold and substrate, is presented here. The annular plate capillary gap formed between the smooth substrate and the prominent O-ring processed by etching the original mold would be filled with the fluid medium. The capillary liquid bridge between the O-ring and substrate produces a closed cavity. The stiction induced by adhesion force and the capillary force induced by air-liquid surface tension could resist the compressed gas and avoid the bubble defect. The effective widths of the prominent O-ring, which are different for various fluids with different surface properties, are deduced by theory analysis. The analysis results provide theoretical basis for the preparation of the mold.