Open AccessA U-shape plasma antenna based on excitation of 5—20 kHz alternating current power supply
Author(s) -
Jiansen Zhao,
Zhitao Zhang,
Wang Jian,
Zhe Yu
Publication year - 2012
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.61.195201
Subject(s) - antenna (radio) , antenna factor , antenna measurement , antenna noise temperature , loop antenna , coaxial antenna , excitation , physics , plasma , antenna efficiency , acoustics , materials science , dipole antenna , electrical engineering , engineering , quantum mechanics
A U-shape plasma antenna is established by a 5—20 kHz alternating current(AC) source. The structure of the antenna is described, and part of electrical characteristics are measured. Results show that in a frequency range from 50 to 400 MHz, the noise level of 5—20 kHz AC plasma antenna is close to that of a metal antenna, but much lower than that of frequency AC plasma antenna. Besides, the antenna shows good impendance and gain bandwith characteristics.