Open AccessThe effect of nitrogen ion bombarding energy on the bonding structure of nitrogenated tetrahedral amorphous carbon film
Author(s) -
韩亮,
邵鸿翔,
何亮,
陈仙,
赵玉清
Publication year - 2012
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.61.106803
Subject(s) - amorphous carbon , materials science , raman spectroscopy , x ray photoelectron spectroscopy , ion , carbon fibers , amorphous solid , nitrogen , crystallography , chemical bond , carbon film , analytical chemistry (journal) , thin film , nanotechnology , chemistry , chemical engineering , organic chemistry , physics , composite number , optics , composite material , engineering
The tetrahedral amorphous carbon (ta-C) films with more than 80% sp3 in fraction are deposited by the filtered cathode vacuum arc technique. Then the energetic nitrogen (N) ions are used to bombard the ta-C films to fabricate nitrogenated tetrahedral amorphous carbon (ta-C:N) films. The composition and the structure of the films are analyzed by visible Raman spectrum and X-ray photoelectron spectroscopy. The result shows that the bombardment of energetic nitrogen ions can form CN bonds, convert CC bonds into CC bonds, and increase the size of sp2 cluster. The CN bonds are composed of CN bonds and CN bonds. The content of CN bonds increases with the N ion bombardment energy increasing, but the content of CN bonds is inversely proportional to the increase of nitrogen ion energy. In addition, CN bonds do not exist in the films.