Open AccessResearch of subwavelength grating based on multilayer films structure
Author(s) -
Gaofeng Liang,
Qing Zhao,
Xin Chen,
Changtao Wang,
Zeyu Zhao,
Xiangang Luo
Publication year - 2012
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.61.104203
Subject(s) - laser linewidth , materials science , grating , photolithography , nanolithography , optics , plasmon , dielectric , resolution (logic) , optoelectronics , surface plasmon resonance , surface plasmon , nanotechnology , computer science , laser , fabrication , physics , nanoparticle , medicine , alternative medicine , pathology , artificial intelligence
Based on the theory of suface plasmon resonance and the special nano-optical effect of metal-dielectric composite, we study super-resolution photolithography using multilayer films. The main point is to use 365 nm exposal light to realize super-resolution imaging by using a mask with a period of 230 nm and linewidth of 100 nm. We discuss the selection of the parameters multi-film with equal thickness, and achieve a sufficient contrast and high intensity through numerical simulation, then verify the obtained results by the plasmon nanolithography technique. Choosing the best scheme, we achieve large-area super-resolution images with the subwavelength structure.