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Preparation and characterization of multilayered titanium/titanium-diamond-like carbon films
Author(s) -
Huang Jiang-Tao,
Kunming Gu,
Mao Fei,
Yongzhong Lie,
Tang Jiao-ning
Publication year - 2012
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.61.088102
Subject(s) - materials science , titanium , composite material , sputter deposition , scanning electron microscope , carbon film , surface roughness , diamond like carbon , diamond , electron cyclotron resonance , material properties of diamond , sputtering , x ray photoelectron spectroscopy , chemical vapor deposition , thin film , metallurgy , nanotechnology , chemical engineering , plasma , physics , quantum mechanics , engineering
The titanium/titanium diamond-like carbon (Ti/Ti-DLC) multi-layered films are deposited by combined electron cyclotron resonance microwave plasma enhanced chemical vapor deposition method and mid-frequency magnetron sputtering method using acetylene as the reactive gas and Ti target with a purity of 99.99%. The structures, compositions and surface morphologies of the samples are characterized by X-ray diffraction, scanning electron microscope, and X-ray photoelectron spectrometer. The mechanical properties of Ti/Ti-DLC multilayer films are investigated by microhardness tester, friction wear test instrument and surface roughmeter. The results show that TiC phase appears in multilayered film. The main growth mode of the film is island mode and there exists columnar crystal structure neither in Ti layer nor Ti-DLC layer. The properties of the multi-layered film, including composite hardness, friction coefficient, surface morphology and surface roughness are affected by the modulation period . It is shown that nano-hardening effect takes place when is small while large particles appear on the surface of the film, leading to a large surface roughness and friction coefficient. The layered structure of the film is not clear when 50 nm.

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