Open AccessSurface-plasmon-mediated emission enhancement from Ag-capped ZnO thin films
Author(s) -
Qiu Dong-Jiang,
Fan Wen-Zhi,
Weng Sheng,
Huizhen Wu,
Jun Wang
Publication year - 2011
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.60.087301
Subject(s) - materials science , bilayer , substrate (aquarium) , thin film , sputtering , evaporation , surface plasmon , optoelectronics , layer (electronics) , surface roughness , surface finish , plasmon , nanotechnology , composite material , oceanography , genetics , physics , membrane , biology , geology , thermodynamics
Ag/ZnO bilayer thin films are fabricated on Si substrates via two-step approach of ZnO sputtering + Ag evaporation. The enhancement of the near band edge (NBE) emission of the ZnO film is realized through coupling between the surface plasmon resonating energy at Ag/ZnO interface and the photonic energy of ZnO NBE emission. The dependence of the emission enhancement ratio of ZnO on the thickness and the growth temperature T of Ag cap-layers are investigated. By evaporating Ag(8 nm) cap-layer onto ZnO(100 nm) film at high substrate temperatures (T300 ℃), the value reaches about 18,i.e., 18, which is more than twice that of Ag(8 nm)/ZnO(100 nm) bilayer films grown at low temperatures (T200 ℃). It is found that the realization of the larger can be ascribed to the bigger surface roughness of Ag/ZnO bilayer samples prepared under higher growth temperatures.