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Influence of pressure on structure and properties of Si-doped glow discharge polymer film
Author(s) -
Ying Zhang,
Z. Y. He,
Jing Yan,
Ping Li,
Tang Yongjian
Publication year - 2011
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.60.066803
Subject(s) - glow discharge , materials science , x ray photoelectron spectroscopy , doping , analytical chemistry (journal) , fourier transform infrared spectroscopy , polymer , band gap , ultraviolet , polymerization , infrared , spectroscopy , optoelectronics , optics , plasma , nuclear magnetic resonance , chemistry , composite material , organic chemistry , physics , quantum mechanics
The Si-doped glow discharge polymer (Si-GDP) films are deposited by glow discharge polymerization technology at different pressures. The structure and the composition of eath Si-doped glow discharge polymer film are characterized by the Fourier transform infrared spectroscopy and x-ray photoelectron. Using ultraviolet/visible spectroscopy, the optical band gap is analyzed. The results show that the Si element exists mainly in the form of Si—C, Si—H, Si—O, Si—CH3. The relative content of Si—C decreases and then increases with the increase of pressure. It can be found that the ratio between C—C and C C decreases with the increase of pressure. As the pressure increases, the optical band-gap decreases and then increases.

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