Open Accessrf excited optical emission spectrum of radicals generated during hot wire chemical vapour deposition for the preparation of microcrystalline silicon thin film
Author(s) -
Tianwei Li,
Fengzhen Liu,
Min Zhu
Publication year - 2011
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.60.018103
Subject(s) - materials science , chemical vapor deposition , plasma enhanced chemical vapor deposition , thin film , excited state , radio frequency , rf power amplifier , analytical chemistry (journal) , microcrystalline , emission spectrum , optoelectronics , spectral line , chemistry , atomic physics , nanotechnology , physics , crystallography , telecommunications , amplifier , cmos , chromatography , astronomy , computer science
To study the radicals behavior in the hot wire chemical vapour deposition (HWCVD) process for the preparation of microcrystalline Si (μc-Si: H) thin film, a weak radio frequency (rf) power was introduced to excite the radicals generated in HWCVD chamber. The spectrum of rf-excited HWCVD (rf-HWCVD) was obtained by subtracting the emission of hot wires from the spectrum measured by OES. The influence of the rf power on the rf-HWCVD spectrum can be neglected as the rf power density was less than 0.1 W/cm2. Under the same deposition parameters,the emission spectra for rf-HWCVD and plasma enhanced CVD (PECVD) processes are different. Under the low deposition pressure (7.5 Pa), the intensities of SiH* and Hα vary with the hot wire temperature reversely, which is characteristic of HWCVD with high gas dissociation rate and high concentration of atomic H. The ratio of intensity of Hα to SiH* in the emission spectrum of rf-HWCVD varying with deposition pressure is consistent with the crystalline fraction of μc-Si: H film. The results indicate that the optical emission spectroscopy measurement is a suitable method for the investigation of the HWCVD process excited by a weak rf-power.