Open AccessAnalysis on the ionization of high power pulsed unbalanced magnetron sputtering powered by direct current
Author(s) -
Mu Zong-Xin,
Xiaodong Mu,
Wu Chun,
Li Jia,
Dong Chen
Publication year - 2011
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.60.015204
Subject(s) - high power impulse magnetron sputtering , ionization , materials science , atomic physics , direct current , plasma , coaxial , cathode , pulsed power , electron avalanche , impulse (physics) , sputter deposition , sputtering , electron , pulsed dc , voltage , physics , ion , electrical engineering , thin film , nanotechnology , engineering , quantum mechanics
High Power impulse Unbalanced Magnetron Sputtering has been coupled to a direct current source (dc-HPPUMS or dc-HiPUMS). A coaxial coil and an attached hollow cathode were applied to control discharge properties and improve pulsed power density. A large extent breakdown was induced for avalanche discharge mechanism. The magnetic trap on sputtering target traps the secondary electrons excited by the avalanche and forms a drift current in magnetic trap. The peak pulse current density is higher than 100 A/cm2 with a pulse frequency less than 40 Hz. The space charge limited condition controls the discharge for plasma far away from equilibrium. The discharge theory was taken to describe the high ionization mechanism in dc-HPPUMS discharge. The parameters deduced from Child law agree with the experimental results.