Open AccessDesign and preparation of sub-wavelength antireflective structures on ZnS
Author(s) -
Xu Qi-Yuan,
ZhengTang Liu,
Yangping Li,
Qian Wu,
Miao Zhang
Publication year - 2011
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.60.014103
Subject(s) - anti reflective coating , materials science , wavelength , transmittance , optoelectronics , reflection (computer programming) , optics , infrared , layer (electronics) , nanotechnology , computer science , physics , programming language
ZnS is one of the excellent materials that are used as long wave window in infrared, but the reflection of the surface is high. In order to reduce the reflection of the ZnS surface, we designed the sub-wavelength antireflective structure on ZnS by coupled-wave theory. The parameters of the sub-wavelength antireflective structure were optimiged and the two-dimensional sub-wavelength antireflective structure on ZnS was fabricated by reactive ion etching technique. The results show that the transmittance of etched ZnS is significantly better than that of bare ZnS at wavelengths of 8—12 μm. This is a new antireflection method using ZnS.