Open AccessElectrostatic oscillation and coupling resonance in double trap of unbalanced magnetron sputtering
Author(s) -
Mu Zong-Xin,
Xiaodong Mu,
Jia Li,
Chun Wang,
Dong Chen
Publication year - 2010
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.59.7164
Subject(s) - oscillation (cell signaling) , cavity magnetron , atomic physics , plasma , coupling (piping) , langmuir probe , materials science , sputter deposition , resonance (particle physics) , plasma parameters , substrate (aquarium) , plasma oscillation , sputtering , physics , plasma diagnostics , thin film , chemistry , nanotechnology , biochemistry , metallurgy , oceanography , quantum mechanics , geology
The coupling resonance is induced by the plasma electrostatic oscillation in the magnetic trap consisting of the cross-field at the surface of the unbalanced magnetron sputtering target and the potential well composed of the magnetron sputtering target and the opposite bias substrate in parallel. Langmuir probe was used to study the plasma properties and power spectra density (PSD) of the floating potential signals. Under typical discharge conditions, the eigenfrequencies in both traps were respectively in the range of 30—50 kHz or 10—20 kHz, and the electron temperatures in both traps calculated with the acoustic standing wave mode conformed with the experimental results.