Open AccessA traceable calibration method for spectroscopic ellipsometry
Author(s) -
Jitao Zhang,
Yan Li,
Luo Zhi-Yong
Publication year - 2010
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.59.186
Subject(s) - ellipsometry , materials science , optics , calibration , thin film , substrate (aquarium) , x ray reflectivity , silicon , analytical chemistry (journal) , optoelectronics , nanotechnology , physics , chemistry , quantum mechanics , oceanography , chromatography , geology
A method for calibrating the spectroscopic ellipsometry by X-ray reflectivity is presented. As an indirect methodspectroscopic ellipsometry does not have the traceability because the measured film thickness is dependent on its optical constant. In contrastat the grazing anglethe X-ray reflectivity can be used to measure the absolute thickness of thin film with sub-nanometer precisionand is independent of the optical constant. Five SiO2 films were deposited on the substrate of single crystal silicon with the thickness of 2 nm18 nm34 nm61 nmand 170 nmrespectively. The results of spectroscopic ellipsometry and X-ray reflectivity were well fitted by a liner equation with slope of 1013±0013 and its intercept was set to zerowhich means this calibration method is valid for spectroscopic ellipsometry in the determination of the thickness of thin films.