Open AccessFocusing characteristic of chromium atoms under elliptical standing wave
Author(s) -
Wentao Zhang,
Bo Zhu,
Xiang Xiong
Publication year - 2009
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.58.8199
Subject(s) - nanostructure , materials science , atom (system on chip) , divergence (linguistics) , chromium , atomic beam , lithography , substrate (aquarium) , laser , atomic physics , beam (structure) , plane (geometry) , standing wave , optics , optoelectronics , nanotechnology , physics , geometry , metallurgy , linguistics , philosophy , oceanography , mathematics , geology , computer science , embedded system
Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms are deposited on the substrate. The characteristics of chromium atoms deposit on a substrateare are discussed. We simulated and analysed the characteristics of nanostructure under different laser power and on different y-plane. At the same time, the characteristics of nanostructure are analysed with respect to the effects of atomic beam divergence, the resulting full width at half maximum and contrast are shown under respective conditions.