z-logo
open-access-imgOpen Access
Influence of penetrating V-pits on leakage current of GaN based p-i-n UV detector
Author(s) -
Shuang Zhang,
Degang Zhao,
Liu Zong-Shun,
Jianjun Zhu,
Shuming Zhang,
Yutian Wang,
Lihong Duan,
Wenbao Liu,
Jiang De-sheng,
Hui Yang
Publication year - 2009
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.58.7952
Subject(s) - ohmic contact , materials science , schottky barrier , leakage (economics) , optoelectronics , schottky diode , contact resistance , dislocation , metal , gallium nitride , current density , layer (electronics) , composite material , metallurgy , physics , diode , quantum mechanics , economics , macroeconomics
The leakage mechanism of GaN-based p-i-n p-AlGaN/i-GaN/n-GaN UV detector has been investigated. With the same dislocation density, devices made from material with higher density of V-pits on surface produce larger leakage current. SEM images show that some V-pits penetrate into i-GaN layer, sometimes even the n-GaN layer. If p-ohmic contact metal Ni/Au deposits in the V-pits, Schottky contact would be formed at the interface of metal and i-GaN, or form ohmic contact at the interface of metal and n-GaN. The existence of parallel Schottky junction and ohmic contact resistance enhances the leakage current greatly.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom