Open AccessInfluence of duty ratio on the fabrication of a-C:H film on microshell
Author(s) -
Baoling Zhang,
Z. Y. He,
Weidong Wu,
Xinghua Liu,
Xinling Yang
Publication year - 2009
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.58.6436
Subject(s) - materials science , surface finish , surface roughness , fabrication , chemical vapor deposition , heavy duty , duty cycle , atomic force microscopy , aspect ratio (aeronautics) , deposition (geology) , analytical chemistry (journal) , optics , nanotechnology , composite material , chemistry , chromatography , medicine , paleontology , power (physics) , alternative medicine , physics , pathology , quantum mechanics , sediment , automotive engineering , engineering , biology
Using low-pressure plasma chemical vapor deposition LPPCVD, with trans-2-butene and hydrogen as the precursors, we have successfully deposited 30 μm CH coatings on microshells in intermittent bounce mode .The surface finish was measured by atomic force microscopy AFM, It was found that the surface finish was improved greatly with reduced duty ratio. When the duty ratio was 1/5, the surface roughness was less than 30 nm for the 30 μm thick a-C:H film. Uniformity of a-C: H films were measured by X-rayradiography. The results showed that the influence was little of duty ratio to the uniformity of a-C: H film. When the duty ratio was 1/7, microshells could not keep on bouncing.