Open AccessFabrication of transparent conductive AZO （ZnO:Al） film by plasma enhanced chemical vapor deposition
Author(s) -
陈兆权,
刘明海,
刘玉萍,
C R Wei,
罗志清,
胡希伟
Publication year - 2009
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.58.4260
Subject(s) - plasma enhanced chemical vapor deposition , materials science , chemical vapor deposition , substrate (aquarium) , transmittance , fabrication , thin film , optoelectronics , silicon , plasma , electrical conductor , transparent conducting film , sheet resistance , chemical engineering , nanotechnology , composite material , layer (electronics) , medicine , alternative medicine , physics , pathology , quantum mechanics , engineering , oceanography , geology
AZOZnO:Al polycrystalline thin films with strong adhesion to the substrate, as low as 89 Ω of sheet electronic resistivity and as high as 79% of visible light transmittance,are fabricated by PECVD plasma enhanced chemical vapor deposition method on glass and silicon substrate. The AZO film fabricated by PECVD is a useful attempt. The AZO transparent conductive film has the good photovoltaic properties like that of ITO In2O3: Sn; moreover, it is cheap, more nontoxic, and more stable in hydrogen plasma environment than ITO. The results obtained are very important to the selection of the technical conditions.