Fabrication of transparent conductive AZO （ZnO:Al） film by plasma enhanced chemical vapor deposition | Zendy

Zhaoquan Chen | Zendy; Minghai Liu | Zendy; Yuping Liu | Zendy; Wei Chen | Zendy; Zhiqing Luo | Zendy; Hu Xi-Wei | Zendy

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Fabrication of transparent conductive AZO （ZnO:Al） film by plasma enhanced chemical vapor deposition

Author(s) -

Zhaoquan Chen,

Minghai Liu,

Yuping Liu,

Wei Chen,

Zhiqing Luo,

Hu Xi-Wei

Publication year - 2009

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.58.4260

Subject(s) - plasma enhanced chemical vapor deposition , materials science , chemical vapor deposition , substrate (aquarium) , transmittance , fabrication , thin film , optoelectronics , silicon , plasma , electrical conductor , transparent conducting film , sheet resistance , chemical engineering , nanotechnology , composite material , layer (electronics) , medicine , alternative medicine , physics , pathology , quantum mechanics , engineering , oceanography , geology

AZOZnO:Al polycrystalline thin films with strong adhesion to the substrate, as low as 89 Ω of sheet electronic resistivity and as high as 79% of visible light transmittance,are fabricated by PECVD plasma enhanced chemical vapor deposition method on glass and silicon substrate. The AZO film fabricated by PECVD is a useful attempt. The AZO transparent conductive film has the good photovoltaic properties like that of ITO In2O3: Sn; moreover, it is cheap, more nontoxic, and more stable in hydrogen plasma environment than ITO. The results obtained are very important to the selection of the technical conditions.

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