Open AccessPreparation of SiOx nanowires in different atmosphere, their morphology, PL and FTIR properties
Author(s) -
郑立仁,
黄柏标,
尉吉勇
Publication year - 2009
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.58.2306
Subject(s) - nanowire , materials science , fourier transform infrared spectroscopy , microstructure , morphology (biology) , photoluminescence , absorption (acoustics) , nanotechnology , chemical engineering , optoelectronics , composite material , biology , engineering , genetics
Highdensity SiOx nanowires were fabricated on a largescale using carbonassisted CVD method by Fe—Al—O catalyst at 1140℃ in flowing N2/H2,N2 and NH3 atmospheres.The SiOx nanowires have uniform diameters of 20—300 nm and lengths of up to a few hundred micrometers. SEM, TEM, EDS, FTIR and PL were preformed to characterize the microstructure, composition and optical performance of the nanowires. Energy dispersive Xray spectral analysis reveals that the nanowires consist of Si and O elements in an atomic ratio of approximately 1∶18The nanowires show IR absorption peaks at 482,806,1095 and 1132 cm-1. The PL peak of the nanowires is located at 440 nm 283eV.The PL inensity of the SiOx nanowire N2 is 104 times that of the SiOx nanowireN2/NH3.