Open AccessDiffraction property of multi-layer dielectric gratings studied by rigorous coupled-wave analysis
Author(s) -
Weijin Kong,
Maojin Yun,
Xingming Sun,
Junhai Liu,
Fan Zheng-Xiu,
Jianda Shao
Publication year - 2008
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.57.4904
Subject(s) - diffraction , diffraction efficiency , grating , materials science , optics , diffraction grating , polarization (electrochemistry) , dielectric , rigorous coupled wave analysis , figure of merit , optoelectronics , physics , chemistry
The rigorous coupled-wave analysis technique for describing the diffraction of multi-layer diffraction grating (MDG) is put forward. Formulations for a stable and efficient numerical implementation of diffraction efficiency are presented for MDG for TE polarization and Littrow angle. With the merit function of the -1 order diffraction efficiency higher than 96%, the parameters of MDG are optimized for HfO2 and SiO2 top layers, respectively. Numerical calculation indicates that a larger grating parameter range can be obtained with HfO2 rather than the SiO2 on the top. The manufacture tolerance and the effective incident angle for the optimized structure of MDG are discussed in the end.