Open AccessLow-loss 193nm anti_reflection coatings
Author(s) -
Shang Shu-Zhen,
Jianda Shao,
Zhengxiu Fan
Publication year - 2008
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.57.1946
Subject(s) - transmittance , molar absorptivity , materials science , absorbance , reflection (computer programming) , optics , reflectivity , scattering , residual , reflection loss , extinction (optical mineralogy) , evaporation , mathematics , composite material , computer science , thermodynamics , optoelectronics , physics , composite number , programming language , algorithm
The optical constants suitable for designing and depositing 193nm AR coatings were calculated, and 193nm AR coatings were designed, produced and characterized on the basis of the calculated results. It was found that the extinction loss of the substrate material had such an important effect that when it was beyond a certain level the designed transmittance could not reach the ideal value. The designed and manufactured results of the single_surface AR coatings revealed that scattering loss began to play the key role when the absorbance loss decreased to a certain extent. High performance 193nm AR coatings with residual reflectance lower than 0.2% have been prepared by the resistant boat evaporation method.