Improving parallel electrode method by sputtering atoms' angle distribution rule | Zendy

Xie Guo-Feng | Zendy

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Improving parallel electrode method by sputtering atoms' angle distribution rule

Author(s) -

Xie Guo-Feng

Publication year - 2008

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.57.1784

Subject(s) - sputtering , trim , materials science , atomic physics , electrode , voltage , extraction (chemistry) , optoelectronics , computer science , physics , thin film , chemistry , nanotechnology , chromatography , operating system , quantum mechanics

In atomic vapor laser isotope separation (AVLIS) engineering, the parallel electrode method has the advantage of simple structure, but when the extraction voltage is high, the sputtering loss is very large and the collection ratio is very low. This paper calculates the angular distribution of sputtering atoms by Trim code. The results show that the angular distribution follows the cosine rule. The collection method is modified according to the rule, which makes the collection ratio very high.

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