Open AccessThe effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering
Author(s) -
物理学报
Publication year - 2007
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.56.7255
Subject(s) - partial pressure , substrate (aquarium) , sputter deposition , materials science , oxygen , sputtering , oxygen pressure , cavity magnetron , optoelectronics , nanotechnology , chemistry , thin film , geology , oceanography , organic chemistry
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