Open AccessProperties of Co nano-films deposited on monocrystalline silicon surface by ion beam sputtering
Author(s) -
物理学报
Publication year - 2007
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.56.7158
Subject(s) - monocrystalline silicon , x ray photoelectron spectroscopy , materials science , sputtering , silicon , nano , ion , ion beam , thin film , optoelectronics , nanotechnology , chemical engineering , chemistry , composite material , organic chemistry , engineering
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