Open AccessA 1/f noise based research of radiation induced interface trap buildup process
Author(s) -
Ruimin Li,
Du Lei,
Yiqi Zhang,
Junlin Bao
Publication year - 2007
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.56.3400
Subject(s) - irradiation , noise (video) , trap (plumbing) , oxide , materials science , mosfet , radiation , atomic physics , molecular physics , physics , optoelectronics , optics , voltage , nuclear physics , transistor , artificial intelligence , meteorology , computer science , image (mathematics) , quantum mechanics , metallurgy
Based on the two-step interface trap buildup model and the statistical thermodynamics mechanism of point defects in solids, a relation between the radiation induced increase of oxide hole-traps and the buildup of interface traps in MOSFET is proposed. Then, based on the correlation between pre-irradiation 1/f noise power spectral density and post-irradiation oxide-trap charge, a sim-empirical expression of pre-irradiation 1/f noise and post-irradiation interface traps buildup is established which agrees well with the experimental results. This model shows that the process of interface trap buildup was influenced by the increasing of oxide hole-traps that could dissociated hydrogen into proton under irradiation. So, the magnitude of pre-irradiation 1/f noise is directly proportional to post-irradiation interface-trap charge and sub-threshold slope. Our results not only proves that the 1/f noise can play a important role in MOSFET irradiation effects, but also proves a new nondestructive method to estimate MOSFET radiation response.