
Effect of substrate temperature on the ZnO thin films as TCO in solar cells grown by MOCVD technique
Author(s) -
Xinliang Chen,
Xue Jun-Ming,
Dekun Zhang,
Jian Sun,
Ren Hui-Zhi,
Ying Zhang,
Xin Geng
Publication year - 2007
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.56.1563
Subject(s) - metalorganic vapour phase epitaxy , materials science , substrate (aquarium) , optoelectronics , thin film solar cell , thin film , solar cell , nanotechnology , epitaxy , layer (electronics) , oceanography , geology
Geng Xin-HuaMicrostructural,optical and electrical properties of updoped-ZnO films grown by metal organic chemical vapor deposition at different substrate temperature were investigated. XRD spectra and SEM photos indicate that the substrate temperature plays an important role on the microstructure of ZnO films. Morphological transition takes place obviously at around 175℃. The morphology of the ZnO films shows sphere-like structure at low temperature (177℃). The grain size of ZnO films grows up with the increase of substrate temperature. The high mobility (17.96 cm2/Vs) and low resistivity (3.28×10-2Ω·cm) at 177℃ have been obtained for undoped-ZnO film deposited on glass substrate. By further optimizing the structure and B-doping, ZnO film as front electrode will be applied in solar cell soon.