
The preliminary result of laser- focused Cr atomic deposition for fabricating nanostructure
Author(s) -
Yan Ma,
Baowu Zhang,
Zheng Cun-Lan,
Shanshan Ma,
Fosheng Li,
Zhanshan Wang,
Tongbao Li
Publication year - 2007
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.56.1365
Subject(s) - standing wave , materials science , laser , nanostructure , silicon , pulsed laser deposition , substrate (aquarium) , collimated light , deposition (geology) , atomic physics , field (mathematics) , optics , optoelectronics , nanotechnology , thin film , physics , paleontology , oceanography , mathematics , sediment , geology , pure mathematics , biology
The technology of laser-focused atomic deposition can be used to develop the nanostrucrure transfer standard of length. When the frequency of laser standing wave is higher than the resonant frequency of atoms, the atoms will be focused on the wave node of the standing wave. The collimated Cr atoms are focused by a standing-wave laser field as they are deposited on a silicon substrate. Atomic force microscopy measurements shows a spacing of 215nm.