Open AccessMolds for nanoimprinting made by modified photoresist
Author(s) -
Leiming Chen,
Yongqiang Guo,
Guo Xi,
Weihua Tang
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.6511
Subject(s) - photoresist , nanolithography , materials science , nanotechnology , nanoimprint lithography , resist , polymer , composite material , fabrication , medicine , alternative medicine , layer (electronics) , pathology
The molds for nanoimprint is very important for nanoimprinting. Many hard materials have been used to make molds. But these materials are difficult to fabricate. In this paper we present a novel technique for making molds based on the modification of polymer by focused ion beam irradiation. This technique is very fast and simple. It can be used in many other domainus of nanofabrication.