Open AccessControl of coercivity of iron films deposited on porous silicon substrates
Author(s) -
Xuejun Qiu,
Yunpeng Zhang,
Zhenghong He,
Lan Bai,
Guolei Liu,
Yue Wang,
Peng Chen,
Zuhong Xiong
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.6101
Subject(s) - coercivity , materials science , substrate (aquarium) , silicon , porosity , sputter deposition , etching (microfabrication) , hysteresis , sputtering , anode , porous silicon , thin film , composite material , analytical chemistry (journal) , optoelectronics , nanotechnology , layer (electronics) , condensed matter physics , electrode , physics , oceanography , chemistry , chromatography , geology
Porous silicon (PS) with different porosity was obtained by anode electrochemical etching of boron-doped Si (100); the as-etched samples were then covered with Fe films by magnetron sputter technique. Analysis of surface profile and structural investigation were done by scanning tunneling microscopy and X-ray diffraction. Magneto-optical Kerr effect was employed to measure the hysteresis loops of the iron films sputtered onto PS and the reference sample on the Si substrate. The coercivity of the PS-based Fe films is larger than that of the Si-based ones, and increases with the porosity of the PS substrate. As for the PS-based samples with the same porosity, the coercivity of Fe films decreases with their thicknesses in a certain range. We found that the spongelike structure of PS can be effectively used to control the coercivity of iron films on the PS substrates.