Open AccessBroadband yellow luminescence in the photoluminescence spectra of n-GaN implanted by the different ions
Author(s) -
Xiaodong Zhang,
Lin De-Xu,
Gongping Li,
Wei You,
Limin Zhang,
Yu Zhang,
Zhengmin Liu
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.5487
Subject(s) - photoluminescence , luminescence , ion , materials science , broadband , spectral line , optoelectronics , optics , physics , astronomy , quantum mechanics
The n-type gallium nitride (GaN) films were implanted with oxygen, nitrogen, magnesium, silicon and gallium ions at room temperature in the dose range from 1013 to 1016 cm-2. All implanted samples were annealed at 900℃ for 10 min in a flowing nitrogen environment. The effects of the implantation ions on the broad yellow luminescence (YL) band were systematically investigated using the photoluminescence (PL) spectra taken at room temperature. A formula based on a semi-empirical model which was proposed by us was deduced, and with it, the experimental data was analyzed and the influence of implanted ions on the intensity of YL band was determined. We can confirm that the effects of the Mg (1016/cm2), Si (≤1014/cm2) and Ga(≥1015/cm2) implanted ions on the YL band are larger than that of the N and O implanted ions.