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Effect of interface and preferred orientation on the hardness of TiN/ZrN multilayers
Author(s) -
Xiaoming Xi,
Juan Wang,
Yang Zhao,
Qingyu Zhang
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.5380
Subject(s) - materials science , tin , modulation (music) , sputtering , diffraction , indentation , composite material , modulus , nanoindentation , hardening (computing) , transmission electron microscopy , sputter deposition , elastic modulus , layer (electronics) , metallurgy , thin film , optics , nanotechnology , philosophy , physics , aesthetics
TiN/ZrN multilayers were fabricated using reactive radio-frequency magnetron sputtering methods. X-ray diffraction analysis was used to determine the modulation structure of the multilayers. Using high-resolution transmission electronic microscopy, the interface was found to be a mixed layer of 2—3 nm in thickness. The nano-indentation measurement showed that the hardness of TiN/ZrN multilayers varied with the modulation period. Both the hardness and elastic modulus had their maximums for the multilayer with a modulation period of about 15.24 nm. The enhancement in hardness is discussed with different hardening mechanisms. The interface states and preferred orientation are assumed to be the main causes of the enhancement of TiN/ZrN multilayers in hardness.

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