Open AccessNumerical simulation of chemical processes in one-dimensional atmospheric plasmas
Author(s) -
JianMing Ouyang,
F. Q. Shao,
Long Wang,
Fang Tong-Zhen,
Jianquan Liu
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.4974
Subject(s) - ambipolar diffusion , diffusion , ion , plasma , electron , diffusion process , materials science , atomic physics , chemical physics , physics , thermodynamics , nuclear physics , innovation diffusion , computer science , quantum mechanics , knowledge management
We numerically simulated the chemical process and one-dimensional diffusion process in atmospheric plasmas. We deduced the three-component (electrons, positive ions and negative ions) ambipolar diffusion formulas, observed the spatial separation of various components in the diffusion process, and showed the influence of diffusion and chemical processes on the temporal evolutions of the electron number density.