Microstructure and optical constants of sputtered Ag films of different thickness
Author(s) -
Xilian Sun,
Ruijin Hong,
Hongji Qi,
Fan Zheng-Xiu,
Jianda Shao
Publication year - 2006
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.4923
Subject(s) - materials science , microstructure , diffraction , sputtering , wavelength , deposition (geology) , optics , sputter deposition , thin film , composite material , optoelectronics , nanotechnology , physics , paleontology , sediment , biology
Ag films with different thickness from 8.2nm to 107.2nm were prepared by DC sputtering deposition and analyzed by X-ray diffraction with the help of optimization program on computer. Microstructrue analysis shows that the films are made of fcc-Ag particles. With the increase of thickness, the mean size of Ag particles increases and the interplaner spacing decreases gradually. The optical constants computed by computer program shows that n value decreases quickly with the increasing thickness below 17.5nm and k value changes in reverse, and then go steadily when the thickness is larger than 17.5nm at the wavelength of 550nm.
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